Oxide vapor deposition material and high-refractive index transparent membrane

The oxide vapor deposition material of present invention is characterized in constituting by a sinter which takes indium oxide as main component and contains 0.110 to 0.538 of cerium based on the ratio of atom amount of Ce/In, and the L* value in the CIE 1976 colorimetric system is 62 to 95. Because...

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Bibliographic Details
Main Authors ABE, YOSHIYUKI, WAKE, RIICHIRO, MAENO, YASUYUKI, KUWAHARA, MASAKAZU
Format Patent
LanguageChinese
English
Published 01.09.2011
Subjects
ARTIFICIAL STONE
BASIC ELECTRIC ELEMENTS
CABLES
CEMENTS
CERAMICS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS
CONCRETE
CONDUCTORS
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
INSULATORS
LIME, MAGNESIA
METALLURGY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
REFRACTORIES
SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
SLAG
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TREATMENT OF NATURAL STONE
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Summary:The oxide vapor deposition material of present invention is characterized in constituting by a sinter which takes indium oxide as main component and contains 0.110 to 0.538 of cerium based on the ratio of atom amount of Ce/In, and the L* value in the CIE 1976 colorimetric system is 62 to 95. Because the aforementioned oxide vapor deposition material that L* value is 62 to 95 has an optimal amount of oxygen, there could produce a high-refractive index transparent membrane, which has high transparence in visible to near-ultrared region and low resistance, that the refractive index in wavelength of 550 nm is 2.15 to 2.51 even if the introducing amount of oxygen gas to membrane-forming vacuum chamber is less, and because the introducing amount of oxygen gas is less, the composition difference between membrane and vapor deposition material could be lessen.
Bibliography:Application Number: TW20100141154