Dry film photoresist and method of use in photolithography for semiconductor manufacture

• Main Authors: PIECHOCKI, ALEXANDER JOSEPH, JORGE, PEDRO GONCALO CARVALHAIS TEIXEIRA DIAS, YUN, HAO
• Format: Patent
• Language: Chinese; English
• Published: 16.08.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

An epoxy-based dry film photoresist and associated method afford excellent performance in imaging very fine lines of circuitry at the wafer level. This photoresist is effective as a tenting dry film in protecting vias and also in capping vias during processing at wafer level in semiconductor manufac...