Dry film photoresist and method of use in photolithography for semiconductor manufacture
An epoxy-based dry film photoresist and associated method afford excellent performance in imaging very fine lines of circuitry at the wafer level. This photoresist is effective as a tenting dry film in protecting vias and also in capping vias during processing at wafer level in semiconductor manufac...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
16.08.2011
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Subjects | |
Online Access | Get full text |
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Summary: | An epoxy-based dry film photoresist and associated method afford excellent performance in imaging very fine lines of circuitry at the wafer level. This photoresist is effective as a tenting dry film in protecting vias and also in capping vias during processing at wafer level in semiconductor manufacture. This epoxy-based photoresist has a low chlorine content. |
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Bibliography: | Application Number: TW20100132211 |