Dry film photoresist and method of use in photolithography for semiconductor manufacture
An epoxy-based dry film photoresist and associated method afford excellent performance in imaging very fine lines of circuitry at the wafer level. This photoresist is effective as a tenting dry film in protecting vias and also in capping vias during processing at wafer level in semiconductor manufac...
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| Main Authors | , , |
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| Format | Patent |
| Language | Chinese English |
| Published |
16.08.2011
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| Subjects | |
| Online Access | Get full text |
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| Abstract | An epoxy-based dry film photoresist and associated method afford excellent performance in imaging very fine lines of circuitry at the wafer level. This photoresist is effective as a tenting dry film in protecting vias and also in capping vias during processing at wafer level in semiconductor manufacture. This epoxy-based photoresist has a low chlorine content. |
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| AbstractList | An epoxy-based dry film photoresist and associated method afford excellent performance in imaging very fine lines of circuitry at the wafer level. This photoresist is effective as a tenting dry film in protecting vias and also in capping vias during processing at wafer level in semiconductor manufacture. This epoxy-based photoresist has a low chlorine content. |
| Author | PIECHOCKI, ALEXANDER JOSEPH JORGE, PEDRO GONCALO CARVALHAIS TEIXEIRA DIAS YUN, HAO |
| Author_xml | – fullname: PIECHOCKI, ALEXANDER JOSEPH – fullname: JORGE, PEDRO GONCALO CARVALHAIS TEIXEIRA DIAS – fullname: YUN, HAO |
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| RelatedCompanies | E. I. DU PONT DE NEMOURS AND COMPANY |
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| Snippet | An epoxy-based dry film photoresist and associated method afford excellent performance in imaging very fine lines of circuitry at the wafer level. This... |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP |
| Title | Dry film photoresist and method of use in photolithography for semiconductor manufacture |
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