Effluent gas recovery system in polysilicon and silane plants

Purified SiHCl3 and/or SiCl4 are used as a sweep gas across a permeate side of a gas separation membrane receiving effluent gas from a polysilicon reactor. The combined sweep gas and permeate is recycled to the reactor.

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Bibliographic Details
Main Authors KOSURI, MADHAVA R, GADRE, SARANG
Format Patent
LanguageChinese
English
Published 01.05.2011
Subjects
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
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Summary:Purified SiHCl3 and/or SiCl4 are used as a sweep gas across a permeate side of a gas separation membrane receiving effluent gas from a polysilicon reactor. The combined sweep gas and permeate is recycled to the reactor.
Bibliography:Application Number: TW201099121648