Mask defect testing apparatus

A mask defect test apparatus, including a tension jig unit having a supporter om which a metal mask to be tested is located, a clamp part disposed at both sides of the supporter to fix opposite edges of the metal mask, and a tension part to apply a tension force to the metal mask fixed by the clamp...

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Bibliographic Details
Main Author PARK, SI-YOUNG
Format Patent
LanguageChinese
English
Published 16.03.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASURING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TESTING
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Summary:A mask defect test apparatus, including a tension jig unit having a supporter om which a metal mask to be tested is located, a clamp part disposed at both sides of the supporter to fix opposite edges of the metal mask, and a tension part to apply a tension force to the metal mask fixed by the clamp part; and a test unit to test the metal mask fixed by the tension jig unit. A vertical distance between the metal mask located on the supporter and the test unit is less than or equal to a vertical distance between the tension jig unit and the test unit.
Bibliography:Application Number: TW201099114342