Projection exposure apparatus for semiconductor lithography comprising an optical correction arrangement
The invention relates to an optical correction arrangement comprising at least one optical element (2), at least one irradiation means for the targeted local irradiation of the optical element (2) with electromagnetic heating radiation (7) for the targeted local heating of the optical element (2), w...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
01.01.2011
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to an optical correction arrangement comprising at least one optical element (2), at least one irradiation means for the targeted local irradiation of the optical element (2) with electromagnetic heating radiation (7) for the targeted local heating of the optical element (2), wherein means for dissipating the thermal energy introduced into the optical element (2) by the at least one irradiation means are present. The invention furthermore relates to a projection exposure apparatus for semiconductor lithography comprising an optical correction arrangement according to the invention. |
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Bibliography: | Application Number: TW20100110702 |