Optical element, process for producing the optical element, and optical device

Disclosed is an optical element (21) characterized by comprising a substrate (22) with a fine concave and convex structure (MR) including a number of fine protrusions (CP) provided on both sides thereof, and a film (23) of one or more layers including a metal layer formed on the fine concave and con...

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Main Authors HAMAMURA, YUTAKA, KADOMATSU, KIYOSHI, TAKADA, YASUTOSHI, TANI, YOSHIRO
Format Patent
LanguageChinese
English
Published 01.12.2009
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Summary:Disclosed is an optical element (21) characterized by comprising a substrate (22) with a fine concave and convex structure (MR) including a number of fine protrusions (CP) provided on both sides thereof, and a film (23) of one or more layers including a metal layer formed on the fine concave and convex structure (MR) formed on one side of the substrate (22). For example, when silicon is used in the substrate (22), the material for the metal layer included in the film (23) is preferably chromium, a chromium-base alloy, titanium, or a titanium-base alloy. The optical element has a high level of light absorption properties in a broad wavelength range from ultraviolet to infrared. Further, contamination of the optical element and optical systems by degassing does not occur. Accordingly, the optical element can be applied to various optical devices.
Bibliography:Application Number: TW20090111432