Electrolytic etching apparatus and method for defining a pattern

An electrolytic etching apparatus and method are provided for defining a pattern on a metal surface of a workpiece. The apparatus includes a working stage, an etching device and an insulating mask. The working stage is provided for carrying the workpiece. The etching device is placed over and movabl...

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Bibliographic Details
Main Authors PA, PAI-SHAN, LIU, WEN-BEN
Format Patent
LanguageChinese
English
Published 16.10.2009
Subjects
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
PRINTED CIRCUITS
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Summary:An electrolytic etching apparatus and method are provided for defining a pattern on a metal surface of a workpiece. The apparatus includes a working stage, an etching device and an insulating mask. The working stage is provided for carrying the workpiece. The etching device is placed over and movable with respect to the working stage. Specifically, the etching device includes a cover, a cathode and an anode. The cover is insulated and defines an input and an output in communication with its inside. The input of the cover is provided for injection of electrolyte into the cover. The output of the cover faces the working stage. The anode of the etching device is disposed inside the cover and is coupled to a positive electrode of a power supply. The cathode located outside of the cover is coupled to a negative electrode of the power supply. Additionally, the insulting mask defines a pattern therein to be overlaid on the workpiece while etching.
Bibliography:Application Number: TW20080112544