Image filtration and light-source adjustment auxiliary system for examining distribution status of supporting material

• Main Authors: ZHUANG, JING-WEN, ZHANG, YAN-ZHI, XIA, MING-CONG, CHEN, JIANNG
• Format: Patent
• Language: Chinese; English
• Published: 01.06.2009
• Subjects: DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The present invention relates to an image filtration and light-source adjustment auxiliary system for examining distribution status of supporting material, which is to dispose a to-be-measured panel onto the adjustable polarizing microscope, and obtain the image data of the to-be-measured panel by means of an image sensor through the polarizing microscope. Furthermore, the image contrast of the transparent conductive layer and the supporting material on the to-be-measured panel is raised in order to adjust and filter out the image of the transparent conductive layer; moreover, when the brightness of the measuring light source is not enough, the brightness of the light-beam penetrating the ready-to-be-measured panel can be raised by means of a light-source controller, thereby being able to maintain the brightness of light-source when examination is carried out and avoiding the misjudgment of the transparent conductive layer as the supporting material.