Method of coating semiconductor processing apparatus with protective yttrium-containing coatings

Methods of applying specialty ceramic materials to semiconductor processing apparatus, where the specialty ceramic materials are resistant to halogen-comprising plasma. The specialty ceramic materials contained at least one yttrium oxide-comprising solid solution. Some embodiments of the specialty c...

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Main Authors HE, XIAO-MING, YUAN, JIE, XU, LI, COLLINS, KENNETH S, DUAN, REN-GUAN, SUN, JENNIFER Y, DEMPSTER, JIM, GRAVES, THOMAS, THACH, SENH
Format Patent
LanguageChinese
English
Published 01.04.2009
Subjects
ARTIFICIAL STONE
BASIC ELECTRIC ELEMENTS
CEMENTS
CERAMICS
CHEMISTRY
COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS
CONCRETE
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
LIME, MAGNESIA
METALLURGY
REFRACTORIES
SEMICONDUCTOR DEVICES
SLAG
TREATMENT OF NATURAL STONE
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Summary:Methods of applying specialty ceramic materials to semiconductor processing apparatus, where the specialty ceramic materials are resistant to halogen-comprising plasma. The specialty ceramic materials contained at least one yttrium oxide-comprising solid solution. Some embodiments of the specialty ceramic materials have been modified to provide a resisvity which reduces the possibility of arcing within a semiconductor processing chamber.
Bibliography:Application Number: TW200897129360