Low-cost electrostatic clamp with fast declamp time
A method for manufacturing a semiconductor wafer electrostatic clamp, comprising providing a mounting plate, forming an insulative layer on an insulating portion of the mounting plate, forming a first electrode on a first portion of the mounting plate, forming a second electrode on a second portion...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
01.03.2009
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Subjects | |
Online Access | Get full text |
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Summary: | A method for manufacturing a semiconductor wafer electrostatic clamp, comprising providing a mounting plate, forming an insulative layer on an insulating portion of the mounting plate, forming a first electrode on a first portion of the mounting plate, forming a second electrode on a second portion of the mounting plate, forming a first segment having a first conductivity over the first electrode, forming a first region having a second conductivity over the first segment that creates an n-type composite, forming a second segment having a third conductivity formed over the second electrode, forming a second region having a fourth conductivity formed over the second region that creates a p-n type composite. |
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Bibliography: | Application Number: TW200796139815 |