Optical imaging arrangement

There is provided an optical imaging arrangement comprising an optical projection unit, at least one of a mask unit and a substrate unit, a first imaging arrangement component, a second imaging arrangement component and a metrology arrangement. the mask unit is adapted to receive a mask comprising a...

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Bibliographic Details
Main Authors JANKER, BERND, DEBITSCH, RASMUS, NEUGEBAUER, DIETMAR, MANGER, MATTHIAS, HOF, ALBRECHT, LAUER, STEFFEN
Format Patent
LanguageChinese
English
Published 01.12.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:There is provided an optical imaging arrangement comprising an optical projection unit, at least one of a mask unit and a substrate unit, a first imaging arrangement component, a second imaging arrangement component and a metrology arrangement. the mask unit is adapted to receive a mask comprising a pattern. The substrate unit is adapted to receive a substrate. The optical projection unit comprises a group of optical element units holding an optical element group, the optical element group being adapted to transfer an image of the pattern onto the substrate. The first imaging arrangement component is a component of the optical projection unit while the second imaging arrangement component is a component of one of the mask unit and the substrate unit. The metrology arrangement captures a spatial relationship between the first imaging arrangement component and the second imaging arrangement component. The metrology arrangement comprises a reference element, the reference element being mechanically connected to
Bibliography:Application Number: TW20080109083