Tantalum and niobium compounds and their use for chemical vapour deposition (CVD)
The present invention relates to special, novel tantalum and niobium compounds, the use thereof for the deposition of tantalum- or niobium-containing layers by means of chemical vapour deposition and the tantalum- or niobium-containing layers produced by this process.
Saved in:
Main Authors | , , , , , , , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
16.08.2008
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The present invention relates to special, novel tantalum and niobium compounds, the use thereof for the deposition of tantalum- or niobium-containing layers by means of chemical vapour deposition and the tantalum- or niobium-containing layers produced by this process. |
---|---|
Bibliography: | Application Number: TW200796129485 |