Device and method for removing residues

• Main Authors: CHOU, PO-FU, LIAO, CHINGIU, CHEN, CHUN-JUNG
• Format: Patent
• Language: Chinese; English
• Published: 01.07.2008
• Subjects: CORRECTION OF TYPOGRAPHICAL ERRORS; i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; LINING MACHINES; PERFORMING OPERATIONS; PRINTING; SELECTIVE PRINTING MECHANISMS; STAMPS; TRANSPORTING; TYPEWRITERS

A device for removing residues includes an object, a sink, and a convey device. The object includes a contact surface. The contact surface includes a residue. A solution is received in the sink. The sink is disposed below the contact surface. The solution corresponds to the contact surface. The conv...