Device and method for removing residues
A device for removing residues includes an object, a sink, and a convey device. The object includes a contact surface. The contact surface includes a residue. A solution is received in the sink. The sink is disposed below the contact surface. The solution corresponds to the contact surface. The conv...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
01.07.2008
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Subjects | |
Online Access | Get full text |
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Summary: | A device for removing residues includes an object, a sink, and a convey device. The object includes a contact surface. The contact surface includes a residue. A solution is received in the sink. The sink is disposed below the contact surface. The solution corresponds to the contact surface. The convey device drives the relative motion between the object and the sink. When the residues of the contact surface are in contact with the solution and the relative motion between the residues of the contact surface and the solution is occurred, the residues are removed by the solution. |
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Bibliography: | Application Number: TW20060148764 |