Photosensitive resin composition for optical waveguide, dry film, optical waveguide, and process for producing the same

• Main Authors: MAEDA, YUKIO, ERIYAMA, YUUICHI, TATARA, RYOUJI, HUANG-FU, JUN
• Format: Patent
• Language: Chinese; English
• Published: 16.03.2008
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

A photosensitive resin composition which comprises: (A) a polymer having structures respectively represented by the following general formulae (1) to (3), the proportions of the structures respectively represented by the general formulae (1), (2), and (3) being 5-40 mol%, 30-90 mol%, and 5-30 mol%, respectively, (1) (2) (3) (wherein R1, R3, and R4 each independently represents hydrogen or methyl; R2 represents an organic group containing a radical-polymerizable reactive group; X and Z each independently represents a single bond or a divalent organic group; and Y represents an organic group having no polymerizability); (B) a compound having one or more ethylenically unsaturated groups per molecule and having a molecular weight lower than 1,000; and (C) a radical photopolymerization initiator. This composition is used to form clad layers (3) and (5) and a core part (4) of an optical waveguide film (1). The composition can be developed with a dilute aqueous alkali solution and can form an optical waveguide havin