Layer-patterning method

A layer-patterning method is provided. The method includes the steps of: providing a substrate; printing a mask material on the substrate to form a mask pattern; heating the mask pattern on the substrate;executing post-process for the substrate; and removing the mask pattern from the surface of the...

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Bibliographic Details
Main Author HSIANG, HSUEH-YU
Format Patent
LanguageChinese
English
Published 16.02.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A layer-patterning method is provided. The method includes the steps of: providing a substrate; printing a mask material on the substrate to form a mask pattern; heating the mask pattern on the substrate;executing post-process for the substrate; and removing the mask pattern from the surface of the substrate.
Bibliography:Application Number: TW20060128241