Tungsten and molybdenum compounds and their use for chemical vapour deposition (CVD)
The present invention relates to specific novel tungsten and molybdenum compounds, to the use thereof for the deposition of tungsten- or molybdenum-containing layers by means of chemical vapour deposition, and to tungsten- or molybdenum-containing layers produced by this process.
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Main Authors | , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
16.10.2007
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Subjects | |
Online Access | Get full text |
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