Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices

• Main Authors: VOHRA, VIVEK, KASHKOUSH, ISMAIL, FANI, PEJMAN, WALTER, ALAN, KORBLER, JOHN
• Format: Patent
• Language: Chinese; English
• Published: 01.01.2007
• Subjects: CLEANING; CLEANING IN GENERAL; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; TRANSPORTING

A system and method for processing and/or cleaning substrates using sonic energy that eliminates or reduces damage to the substrates. In one aspect, the invention utilizes and produces low power density sonic energy to effectively remove particles from a substrate. In another aspect, the invention u...