Resistive radiation heater fabricated by linear cutting electric discharge machining

• Main Authors: LIN, CHUN-TANG, GUO, SHOU-YI, SHIAU, JIAN-NAN, HUANG, JIAN-YAU, CHEN, FENG-ZHI, KE, ZHI-ZHONG
• Format: Patent
• Language: Chinese; English
• Published: 01.06.2006
• Subjects: ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY

This invention is to use linear cutting electric discharge machining to fabricate a resistive radiation heater used to heat the bottom of a semiconductor wafer substrate. The heater comprises: a reflector plate whose bottom is a polished surface used to reflect the heat of radiation; a heater plate made of a refractory metal and having the resistive effect, arranged at a proper position at the bottom of the reflector plate; a set of suspension components used to connect the heater plate and the reflector plate, and a power supply comprising two set of extended electrodes made of a refractory metal that are separately connected to the heater plate. By the disclosed structure above, the heater plate is used as an electrode connected to the power supply to form a current circuit, so the heater plate can be heated resistively to make the heat of the radiation emit from the surface of the heater plate to heat a semiconductor wafer substrate. This structure can make the heating have a better uniformity and can avoi