Junction where electrical interconnects intersect, semiconductor device and method of manufacturing the same

A junction where electrical interconnects intersect, semiconductor device and method of manufacturing the same. The junction includes a portion of at least one current providing electrical interconnect having a length to a longitudinal axis thereof and configured to provide a flow of electrical curr...

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Bibliographic Details
Main Authors WANG, CHENJIA, CHUANG, HARRY
Format Patent
LanguageChinese
English
Published 01.01.2006
Subjects
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Summary:A junction where electrical interconnects intersect, semiconductor device and method of manufacturing the same. The junction includes a portion of at least one current providing electrical interconnect having a length to a longitudinal axis thereof and configured to provide a flow of electrical current. In addition, the junction includes a portion of at least one current receiving electrical interconnect having a length parallel to a longitudinal axis thereof and configured to intersect with the at least one current providing electrical interconnect at the junction in order to receive the flow of the electrical current from the at least one current providing electrical interconnect. Also, the junction includes at least one current directing feature positioned between the current providing electrical interconnect and current receiving interconnects, and oriented substantially non-perpendicular to the longitudinal axis of the at least one current providing interconnect.
Bibliography:Application Number: TW200594117792