Photosensitive resin composition for optical waveguide formation and optical waveguide

A photosensitive resin composition for optical waveguide formation comprises the following ingredients (A), (B), and (C) as components. This composition is excellent in suitability for patterning, refractive index, heat resistance, transmission characteristic, etc. (A) A di(meth)acrylate having a st...

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Bibliographic Details
Main Authors ERIYAMA, YUUICHI, TAKASE, HIDEAKI
Format Patent
LanguageChinese
English
Published 01.11.2004
Subjects
CHEMISTRY
COMPOSITIONS BASED THEREON
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
METALLURGY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORGANIC MACROMOLECULAR COMPOUNDS
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:A photosensitive resin composition for optical waveguide formation comprises the following ingredients (A), (B), and (C) as components. This composition is excellent in suitability for patterning, refractive index, heat resistance, transmission characteristic, etc. (A) A di(meth)acrylate having a structure represented by the following general formula (1): wherein R represents -(OCH2CH2)m-, etc.; X represents -C(CH3)2-, etc.; Y represents hydrogen or halogeno; and m is an integer of 0 to 4; (B) a mono(meth)acrylate having a structure represented by the following general formula (2): in which R represents -(OCH2CH2)p-, etc.; Y represents hydrogen, halogeno, Ph, etc.; and p is an integer of 0 to 4; provided that Ph represents phenyl; and (C) a free-radical photopolymerization initiator.
Bibliography:Application Number: TW20030127694