Photosensitive resin composition for optical waveguide formation and optical waveguide
A photosensitive resin composition for optical waveguide formation comprises the following ingredients (A), (B), and (C) as components. This composition is excellent in suitability for patterning, refractive index, heat resistance, transmission characteristic, etc. (A) A di(meth)acrylate having a st...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
01.11.2004
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Subjects | |
Online Access | Get full text |
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Summary: | A photosensitive resin composition for optical waveguide formation comprises the following ingredients (A), (B), and (C) as components. This composition is excellent in suitability for patterning, refractive index, heat resistance, transmission characteristic, etc. (A) A di(meth)acrylate having a structure represented by the following general formula (1): wherein R represents -(OCH2CH2)m-, etc.; X represents -C(CH3)2-, etc.; Y represents hydrogen or halogeno; and m is an integer of 0 to 4; (B) a mono(meth)acrylate having a structure represented by the following general formula (2): in which R represents -(OCH2CH2)p-, etc.; Y represents hydrogen, halogeno, Ph, etc.; and p is an integer of 0 to 4; provided that Ph represents phenyl; and (C) a free-radical photopolymerization initiator. |
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Bibliography: | Application Number: TW20030127694 |