Automatic spraying and blowing clean device of wafer box base

An automatic spraying and blowing clean device of wafer box base is used to clean the wafer box base. The wafer box has a base located at its bottom side. The automatic spraying and blowing cleaning device includes: a frame; an upper carrier and a lower carrier formed on the frame and capable of con...

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Bibliographic Details
Main Author SU, ZHAO-MING
Format Patent
LanguageChinese
English
Published 01.08.2004
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:An automatic spraying and blowing clean device of wafer box base is used to clean the wafer box base. The wafer box has a base located at its bottom side. The automatic spraying and blowing cleaning device includes: a frame; an upper carrier and a lower carrier formed on the frame and capable of connecting to each other; a driving mechanism for driving the upper and lower carriers to move with respect to each other; an exhausting mechanism for exhausting the powder and metal residuals blew by the gas to fall in the cleaning space, and a spraying and blowing mechanism arranged in the cleaning space between the upper and lower carriers and spraying and blowing gas to the cleaning space. The spraying and blowing mechanism has an upper spraying and blowing unit and a lower spraying and blowing unit to spray and blow gas to the cleaning space, so as to clean the wafer box base located in the cleaning space.
Bibliography:Application Number: TW20030101020