Organic anti-reflective coating compositions for advanced microlithography
New polymers and new anti-reflective compositions containing such polymers are provided. The compositions comprise a polymer (e.g., epoxy cresol novolac resins) bonded with a chromophore (4-hydroxybenzoic acid, trimellitic anhydride). The inventive compositions can be applied to substrates (e.g., si...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
16.08.2003
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Subjects | |
Online Access | Get full text |
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Summary: | New polymers and new anti-reflective compositions containing such polymers are provided. The compositions comprise a polymer (e.g., epoxy cresol novolac resins) bonded with a chromophore (4-hydroxybenzoic acid, trimellitic anhydride). The inventive compositions can be applied to substrates (e.g., silicon wafers) to form anti- reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing. |
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Bibliography: | Application Number: TW200291137862 |