WORKPIECE COMPRISING AN ALCR-CONTAINING HARD MATERIAL LAYER

Vacuum coating system comprises a coating chamber, where a substrate holder, preferably double-rotatable or three-way rotating holder is arranged in the coating chamber. Cathodic arc sources are provided with two type targets, where the two type targets are made of aluminum and chromium having diffe...

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Bibliographic Details
Main Authors REITER Andreas, DERFLINGER Volker, GEY Christoph
Format Patent
LanguageEnglish
Slovenian
Published 28.02.2019
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:Vacuum coating system comprises a coating chamber, where a substrate holder, preferably double-rotatable or three-way rotating holder is arranged in the coating chamber. Cathodic arc sources are provided with two type targets, where the two type targets are made of aluminum and chromium having different ratio of aluminum or chromium.
Bibliography:Application Number: SI20040032455T