Centrifugal coating apparatus with detachable outer cup

A coating apparatus comprises a spin chuck for supporting a wafer rotatably, a driving mechanism for rotating the spin chuck, a nozzle for supplying a resist solution or a solvent to the wafer supported by the spin chuck, an outer cup arranged to surround the wafer supported by the spin chuck, an in...

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Bibliographic Details
Main Author KONISHI NOBUO
Format Patent
LanguageEnglish
Published 18.04.2000
Edition7
Subjects
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
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Summary:A coating apparatus comprises a spin chuck for supporting a wafer rotatably, a driving mechanism for rotating the spin chuck, a nozzle for supplying a resist solution or a solvent to the wafer supported by the spin chuck, an outer cup arranged to surround the wafer supported by the spin chuck, an inner cup formed like a ring and arranged along an outer peripheral portion of the wafer to be coated over and in close vicinity of the outer peripheral portion upon coating, and an attaching and detaching mechanism for attaching and detaching the inner cup.
Bibliography:Application Number: SG19980001489