SPUTTERING SYSTEMS FOR LIQUID TARGET MATERIALS
A sputtering system comprises a magnetron assembly for depositing liquid metal films on a substrate. The magnetron assembly comprises a horizontal planar magnetron with a liquid metal target, a cylindrical rotatable magnetron with a metal target and a set of one or more shields forming a chamber bet...
Saved in:
Main Author | |
---|---|
Format | Patent |
Language | English |
Published |
29.05.2014
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | A sputtering system comprises a magnetron assembly for depositing liquid metal films on a substrate. The magnetron assembly comprises a horizontal planar magnetron with a liquid metal target, a cylindrical rotatable magnetron with a metal target and a set of one or more shields forming a chamber between the planar and the rotatable magnetron. |
---|---|
AbstractList | A sputtering system comprises a magnetron assembly for depositing liquid metal films on a substrate. The magnetron assembly comprises a horizontal planar magnetron with a liquid metal target, a cylindrical rotatable magnetron with a metal target and a set of one or more shields forming a chamber between the planar and the rotatable magnetron. |
Author | HOLLARS, DENNIS, R |
Author_xml | – fullname: HOLLARS, DENNIS, R |
BookMark | eNrjYmDJy89L5WTQCw4IDQlxDfL0c1cIjgwOcfUNVnDzD1Lw8QwM9XRRCHEMcncNUfB1BClx9AnmYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxwe5GBoYmBoaGZgamjsZEKQIAUbQoNA |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences |
ExternalDocumentID | SG2014011605A |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_SG2014011605A3 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 13:01:19 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_SG2014011605A3 |
Notes | Application Number: SG20140011605 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140529&DB=EPODOC&CC=SG&NR=2014011605A |
ParticipantIDs | epo_espacenet_SG2014011605A |
PublicationCentury | 2000 |
PublicationDate | 20140529 |
PublicationDateYYYYMMDD | 2014-05-29 |
PublicationDate_xml | – month: 05 year: 2014 text: 20140529 day: 29 |
PublicationDecade | 2010 |
PublicationYear | 2014 |
RelatedCompanies | NUVOSUN, INC |
RelatedCompanies_xml | – name: NUVOSUN, INC |
Score | 2.9437354 |
Snippet | A sputtering system comprises a magnetron assembly for depositing liquid metal films on a substrate. The magnetron assembly comprises a horizontal planar... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
Title | SPUTTERING SYSTEMS FOR LIQUID TARGET MATERIALS |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140529&DB=EPODOC&locale=&CC=SG&NR=2014011605A |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT4MwEL_MadQ3nRp1aogxvKEChcEDMYyvzYwN12Lm07ICJsZkLg7jv-8Vme5pb22vuX4k17tfr3cFuOFWkWfaPVeIwQuF8Fchc4am6JxY-kzNDWKKaOR4aPZS8jgxJg14X8XCVHlCv6vkiChRGcp7WZ3Xi_9LLL96W7m842_Y9PEQMseXa3SMaMFAAO13nSAZ-SNP9jyHRvJw_EtTVTTe3S3YFna0SLQfPHdFWMpiXaeEB7CTILt5eQiNYt6CPW_19VoLduPa443FWviWR3BLk5SxKgeURF8oC2IqIYaTBv2ntO9LzB1HAZNiV3RxB_QYrsOAeT0FB57-LXNKo7VJ6ifQRPxfnIKU5ZmemVoHFTliKYtbWtExbWKjsaXPbGKeQXsDo_ON1Dbsi5pwh2v2BTTLz6_iErVsya-q3fkBw2R64Q |
link.rule.ids | 230,309,786,891,25594,76904 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8gGvFNUaPix2LM3qZu68Z4IGbsC3QDpIXg00K3mRgTJDLjv-91DuWJt6bXXK9Nrne_Xu8KcMOtLE20e64Qg2cK4a9C5wxN0Tmx9JmaGsQU2chR3-yOyePUmFbgfZULU9QJ_S6KI6JGJajveXFeL_4vsdzibeXyjr9h18eDz9quXKJjRAsGAmi30_aGA3fgyI7TpoHcH_3SVBWdd3sLtpuICUWhfW_SEWkpi3Wb4u_DzhDZzfMDqGTzOtSc1ddrddiNyog3NkvlWx7CLR2OGStqQEn0hTIvohJiOCnsPY97rsTsUeAxKbLFEDukR3Dte8zpKjhx_LfMmAZrQurHUEX8n52AlKSJnphaEw05YimLW1qG8pMWOlv6rEXMU2hsYHS2kXoFtS6Lwjjs9Z8asCcoIjSutc6hmn9-ZRdocXN-WezUD6gDfcw |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=SPUTTERING+SYSTEMS+FOR+LIQUID+TARGET+MATERIALS&rft.inventor=HOLLARS%2C+DENNIS%2C+R&rft.date=2014-05-29&rft.externalDBID=A&rft.externalDocID=SG2014011605A |