A METHOD FOR FORMING A PIEZOELECTRIC DEVICE

A Method For Forming A Piezoelectric Device AbstractThere is provided a method for forming a piezoelectricdevice comprising the steps of: (a) depositing a first electrode layer; (b) depositing a piezoelectric material layer on the first electrode layer to thereby cover the first electrode layer whil...

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Bibliographic Details
Main Authors ZHANG LEI, WONG TING CHONG, TAN CHIN YAW, YAO KUI, SHARON OH SU YIN
Format Patent
LanguageEnglish
Published 30.04.2013
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Summary:A Method For Forming A Piezoelectric Device AbstractThere is provided a method for forming a piezoelectricdevice comprising the steps of: (a) depositing a first electrode layer; (b) depositing a piezoelectric material layer on the first electrode layer to thereby cover the first electrode layer while leaving a region of the firstelectrode layer uncovered; (c) depositing a second electrode layer on the piezoelectric material layer; (d) depositing a piezoelectric material layer on the second electrode layer to thereby cover the second electrode layer while leaving a region of the second electrodelayer uncovered; and (e) repeating steps (a) to (c), and optionally step (d), to build multiple repeating first electrode layers separated from the second electrode layers by piezoelectric material layers, wherein all of the uncovered regions of the first electrode layersconverge at a point A to integrally form a first electrode and all of the uncovered regions of the second electrode layers converge at a point B to integrally form a second electrode in which point A is displaced at a distance from point B.(Fig. 1(S) and Fig. 1(t))
Bibliography:Application Number: SG20120069050