LITHOGRAPHIC APPARATUS AND METHOD

Lithographic Apparatus and MethodA lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.[Fig. 9]

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Bibliographic Details
Main Authors ROBBERT JAN VOOGD, NICOLAAS TEN KATE, GIOVANNI FRANCISCO NINO, JOOST JEROEN OTTENS, BASTIAAN ANDREAS WILHELMUS HUBERTUS KNARREN, LAURENT, THIBAULT, SIMON, MATHIEU, KUNNEN, JOHAN, GERTRUDIS, CORNELIS, JACOBS, JOHANNES, HENRICUS, WILHELMUS, MARINUS JAN REMIE
Format Patent
LanguageEnglish
Published 28.10.2011
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Summary:Lithographic Apparatus and MethodA lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.[Fig. 9]
Bibliography:Application Number: SG20110017159