LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibr...

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Main Authors KEMPER, NICOLAAS RUDOLF, MIGCHELBRINK, FERDY, DONDERS, SJOERD NICOLAAS LAMBERTUS, EVERS, ELMAR, JACOBS, JOHANNES HENRICUS WILHELMUS, HOOGENDAM, CHRISTIAAN ALEXANDER, BECKERS, MARCEL, TEN KATE, NICOLAAS
Format Patent
LanguageEnglish
Published 29.06.2011
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Abstract A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. [Figure No.1]
AbstractList A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. [Figure No.1]
Author EVERS, ELMAR
HOOGENDAM, CHRISTIAAN ALEXANDER
BECKERS, MARCEL
JACOBS, JOHANNES HENRICUS WILHELMUS
TEN KATE, NICOLAAS
DONDERS, SJOERD NICOLAAS LAMBERTUS
MIGCHELBRINK, FERDY
KEMPER, NICOLAAS RUDOLF
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– fullname: EVERS, ELMAR
– fullname: JACOBS, JOHANNES HENRICUS WILHELMUS
– fullname: HOOGENDAM, CHRISTIAAN ALEXANDER
– fullname: BECKERS, MARCEL
– fullname: TEN KATE, NICOLAAS
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Snippet A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and...
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Title LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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