LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibr...

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Main Authors KEMPER, NICOLAAS RUDOLF, MIGCHELBRINK, FERDY, DONDERS, SJOERD NICOLAAS LAMBERTUS, EVERS, ELMAR, JACOBS, JOHANNES HENRICUS WILHELMUS, HOOGENDAM, CHRISTIAAN ALEXANDER, BECKERS, MARCEL, TEN KATE, NICOLAAS
Format Patent
LanguageEnglish
Published 29.06.2011
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Summary:A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. [Figure No.1]
Bibliography:Application Number: SG20110031127