RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

• Main Authors: KRIVTSUN, VLADIMIR MIHAILOVITCH, IVANOV, VLADIMIR VITALAEEVITCH, SIDELKOV, YURII VICTOROVITCH, STEVENS, LUCAS HENRICUS JOHANNES, KOSHELEV, KONSTANTIN NIKOLAEVITCH, BANINE, VADIM YEVGENYEVICH, KIEFT, ERIK RENE, ROELEF LOOPSTRA. ERIK, FRIJNS, OLAV WALDEMAR VLADIMIR, GAYAZOV, ROBERT RAFILEVITCH, KOLOSHNIKOV, VSEVOLOD GRIGOREVITECH
• Format: Patent
• Language: English
• Published: 29.07.2009
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; BLASTING; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GAMMA RAY OR X-RAY MICROSCOPES; HEAT EXCHANGE IN GENERAL; HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS,IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT; HEATING; HOLOGRAPHY; IRRADIATION DEVICES; LIGHTING; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MECHANICAL ENGINEERING; NANOTECHNOLOGY; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR; TRANSPORTING; WEAPONS; X-RAY TECHNIQUE

Radiation Source, Lithographic Apparatus, and Device Manufacturing Method. A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. To improve heat dissipation, the radiation source comprises a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected.To improve the exact timing of the pinch formation and thus the pulse of EUV radiation, the radiation source comprises a triggering device.To improve the conversion efficiency, the radiation source is constructed to have a low inductance, and operated in a self- triggering regime.