SEMICONDUCTOR PROCESSING SYSTEM WITH ULTRA LOW-K DIELECTRIC

SEMICONDUCTOR PROCESSING SYSTEM WITH ULTRA LOW-K DIELECTRIC A semiconductor processing system with ultra low-K dielectric is provided including providing a substrate having an electronic circuit, forming an ultra low-K dielectric layer, having porogens, over the substrate, blocking an incoming radia...

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Bibliographic Details
Main Authors CHAO ZHANG BEI, WIDODO JOHNNY, CHOO HSIA LIANG, YUDHISTIRA YASRI
Format Patent
LanguageEnglish
Published 29.07.2008
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Summary:SEMICONDUCTOR PROCESSING SYSTEM WITH ULTRA LOW-K DIELECTRIC A semiconductor processing system with ultra low-K dielectric is provided including providing a substrate having an electronic circuit, forming an ultra low-K dielectric layer, having porogens, over the substrate, blocking an incoming radiation from a first region of the ultra low-K dielectric layer, evaporating the porogens from a second region of the ultra low-K dielectric layer by projecting the incoming radiation on the second region, and removing the ultra low-K dielectric layer in the first region with a developer.
Bibliography:Application Number: SG20070177983