TEMPERATURE CONDITIONED LOAD LOCK, LITHOGRAPHIC APPARATUS COMPRISING SUCH A LOAD LOCK AND METHOD OF MANUFACTURING A SUBSTRATE WITH SUCH A LOAD LOCK

A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock al...

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Bibliographic Details
Main Authors KUIPERS, LEO WILHELMUS MARIA, KLOMP, ALBERT JAN HENDRIK, FRANSSEN, JOHANNES HENDRIKUS GERTRUDIS, VISSER, RAIMOND, HOOGKAMP, JAN FREDERIK, VUGTS, JOSEPHUS CORNELIUS JOHANNES ANTONIUS, VULLINGS, HENRICUS JOHANNES LOUIS MARIE
Format Patent
LanguageEnglish
Published 28.10.2005
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.
Bibliography:Application Number: SG20040001152