LEVELLABLE MASK REPOSITORY DEVICE

Disclosed is a levellable mask repository device, comprising a mask repository structure (), a rotary shaft structure (3) and a frame structure (2). The mask repository structure (4) is mounted on the frame structure (2), and thus can be levelled by means of the rotary shaft structure (3) via the fr...

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Bibliographic Details
Main Authors FAN, Yongwei, CHEN, Huaiyang
Format Patent
LanguageEnglish
Published 27.02.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Disclosed is a levellable mask repository device, comprising a mask repository structure (), a rotary shaft structure (3) and a frame structure (2). The mask repository structure (4) is mounted on the frame structure (2), and thus can be levelled by means of the rotary shaft structure (3) via the frame structure (2); and the mask repository structure (4) can further be levelled relative to the frame structure (2). 17
Bibliography:Application Number: SG20191100824X