HETEROARYL DERIVATIVES AND USES THEREOF

The present invention relates to antimalarial compounds and their use against protozoa of the genus Plasmodium, including drug-resistant Plasmodia strains. This invention further relates to compositions containing such compounds and a process for making the compounds.

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Bibliographic Details
Main Authors SCHIEHSER, GUY, ALAN, SAIONZ, KURT, WILLIAM, SHIEH, HONG-MING, HEFFERNAN, GAVIN, DAVID, JACOBUS, DAVID, PENMAN, ZHAO, WENYI
Format Patent
LanguageEnglish
Published 29.06.2015
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Summary:The present invention relates to antimalarial compounds and their use against protozoa of the genus Plasmodium, including drug-resistant Plasmodia strains. This invention further relates to compositions containing such compounds and a process for making the compounds.
Bibliography:Application Number: SG20151103517W