PEROXIDE-VAPOR TREATMENT FOR ENHANCING PHOTORESIST-STRIP PERFORMANCE AND MODIFYING ORGANIC FILMS

Methods and apparatus for treating an organic film such as photoresist with a hydroxyl-generating compound prior to removing the organic film from a substrate are provided. Treatments include exposure to one or more of hydrogen peroxide vapor and water vapor in a non-plasma environment. In some impl...

Full description

Saved in:
Bibliographic Details
Main Authors JACOBS, BRADLEY JON, CHEUNG, DAVID, BERRY, IVAN, THEDJOISWORO, BAYU ATMAJA
Format Patent
LanguageEnglish
Published 28.01.2016
Subjects
ELECTRICITY
Online AccessGet full text

Cover

More Information
Summary:Methods and apparatus for treating an organic film such as photoresist with a hydroxyl-generating compound prior to removing the organic film from a substrate are provided. Treatments include exposure to one or more of hydrogen peroxide vapor and water vapor in a non-plasma environment. In some implementations, conditions are such that condensation on the surface is suppressed. Methods include treating high-dose ion-implantation photoresists and post-plasma doping photoresists with little or no material loss and permit mild plasma removal of the photoresist after treatment.
Bibliography:Application Number: SG20151004321S