METHOD OF SURFACE PREPARATION FOR PLASMA SPUTTERING OF COATINGS

• Main Authors: TAT'MJANIN ANDREJ ALEKSANDROVICH, IVANOVSKIJ VLADIMIR SERGEEVICH, PETROV ALEKSANDR NIKOLAEVICH, KARTSEV SERGEJ VASIL'EVICH, GAVRILOV DMITRIJ ALEKSANDROVICH, EROFEEV MIKHAIL NIKOLAEVICH, SHAKHOV ALEKSANDR MIKHAJLOVICH
• Format: Patent
• Language: English; Russian
• Published: 27.07.2008
• Subjects: ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; GRINDING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; POLISHING; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

FIELD: technological process. ^ SUBSTANCE: invention is related to methods of surface preparation for plasma sputtering of coatings and may be used for cleaning of different surfaces with abrasive materials. Method includes abrasive treatment of surface that is subject to sputtering with thermal abrasive jet directed at the angle of 40...45° to processed surface. Jet is formed from high-temperature gas flow with abrasive loose material with fraction size of 0.3 - 0.7 mm. Processing is carried out until surface roughness is 40-50 micrometer, at that the mentioned surface is heated with high-temperature flow of gases up to 70 - 210°C. ^ EFFECT: provision of high-quality adhesion of coating with surface subject to sputtering.