METHOD OF CLEANING PROCESS EQUIPMENT TO REMOVE POLYMER AND RESIN DEPOSITS
FIELD: cleaning processes. ^ SUBSTANCE: cleaning is accomplished by way of destruction, in particular in monomer and polymer production processes. Method comprises treating equipment with a destroying system, particularly with 0.0001 to 40% solution of 2,2',6,6'-tetramethyl-4-oxopiperidine...
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Main Authors | , , , , , |
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Format | Patent |
Language | English Russian |
Published |
10.01.2005
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | FIELD: cleaning processes. ^ SUBSTANCE: cleaning is accomplished by way of destruction, in particular in monomer and polymer production processes. Method comprises treating equipment with a destroying system, particularly with 0.0001 to 40% solution of 2,2',6,6'-tetramethyl-4-oxopiperidine-1-oxyl or a mixture thereof with 2,2',6,6'-tetramethyl-4-oxopiperidine-4-fulvene in organic solvent. ^ EFFECT: prolonged operational cycle due to enabled on-line cleaning procedure and reduced loss of desired products. ^ 1 tbl |
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Bibliography: | Application Number: RU20030125484 |