METHOD OF CLEANING PROCESS EQUIPMENT TO REMOVE POLYMER AND RESIN DEPOSITS

FIELD: cleaning processes. ^ SUBSTANCE: cleaning is accomplished by way of destruction, in particular in monomer and polymer production processes. Method comprises treating equipment with a destroying system, particularly with 0.0001 to 40% solution of 2,2',6,6'-tetramethyl-4-oxopiperidine...

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Main Authors TRIFONOVA O.M, SHATILOV V.M, GIL'MANOV KH.KH, BOREJKO N.P, JAFIZOVA V.P, SAKHIPOV L.S
Format Patent
LanguageEnglish
Russian
Published 10.01.2005
Edition7
Subjects
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Summary:FIELD: cleaning processes. ^ SUBSTANCE: cleaning is accomplished by way of destruction, in particular in monomer and polymer production processes. Method comprises treating equipment with a destroying system, particularly with 0.0001 to 40% solution of 2,2',6,6'-tetramethyl-4-oxopiperidine-1-oxyl or a mixture thereof with 2,2',6,6'-tetramethyl-4-oxopiperidine-4-fulvene in organic solvent. ^ EFFECT: prolonged operational cycle due to enabled on-line cleaning procedure and reduced loss of desired products. ^ 1 tbl
Bibliography:Application Number: RU20030125484