TRICHLOROSILANE PRODUCTION PROCESS

FIELD: silicon compounds technology. SUBSTANCE: process involves activation of silicon tetrachloride-hydrogen interaction by high-energy (0.5-2.5 MeV) electron beam in flow-type reactor containing tetrachloride-hydrogen gas-vapor mixture or any worked-out gas-vapor mixtures containing silicon tetrac...

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Bibliographic Details
Main Authors BORISOVA L.A, MURAVITSKIJ S.A, KUCHUMOV B.M, KUKSANOV N.K, REZNICHENKO M.F, KORCHAGIN A.I, KUZNETSOV F.A, LAVRUKHIN A.V
Format Patent
LanguageEnglish
Published 10.04.2000
Edition7
Subjects
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
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Summary:FIELD: silicon compounds technology. SUBSTANCE: process involves activation of silicon tetrachloride-hydrogen interaction by high-energy (0.5-2.5 MeV) electron beam in flow-type reactor containing tetrachloride-hydrogen gas-vapor mixture or any worked-out gas-vapor mixtures containing silicon tetrachloride. EFFECT: reduced power consumption. 2 cl, 4 ex
Bibliography:Application Number: RU19990103236