METHOD AND APPARATUS FOR LOW-CONCENTRATION TOXIC VAPORIZED IMPURITIES FROM INDUSTRIAL GASES

FIELD: gas treatment. SUBSTANCE: industrial gases with partial pressure below saturation pressure are pumped through ionizators action zone to form charged particles in gas. Pumping velocity and gas ionization intensity are regulated such as to provide total number of ions created in the ionization...

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Bibliographic Details
Main Authors KOZYREV A.V, BUGAEV S.P, SOCHUGOV N.S
Format Patent
LanguageEnglish
Published 10.06.1998
Edition6
Subjects
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
THEIR RELEVANT APPARATUS
TRANSPORTING
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Summary:FIELD: gas treatment. SUBSTANCE: industrial gases with partial pressure below saturation pressure are pumped through ionizators action zone to form charged particles in gas. Pumping velocity and gas ionization intensity are regulated such as to provide total number of ions created in the ionization zone expressed as 1 ion per 2-6 molecules of impurities. Aerosol formed by condensed impurities is then removed from gas in a zone where particle size and mass of the aerosol are at their maximum. Apparatus contains generator to form particles in the gas under treatment, gas- pumping system, ionization chamber, as well as coagulation chamber and a system for continuously removing aerosol from gas connected in series with ionization chamber. EFFECT: reduced power consumption. 2 cl, 1 dwgf
Bibliography:Application Number: RU19960123881