Preparation of cyclohexene carboxylate derivatives

• Main Authors: ZHANG, LIJUN, KIM, CHOUNG U, MUNGER, JOHN D, PRISBE, ERNEST J, WILLAIMS, MATTHEW A, MCGEE, LAWRENCE R, KELLY, DAPHNE E, POSTICH, MICHAEL J, ROHLOFF, JOHN C, KENT, KENNETH M
• Format: Patent
• Language: English
• Published: 31.01.2003
• Edition: 7
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; APPARATUS THEREFOR; CHEMISTRY; GENERAL METHODS OF ORGANIC CHEMISTRY; HETEROCYCLIC COMPOUNDS; METALLURGY; ORGANIC CHEMISTRY

A process for preparing compounds of formula (51) comprises reacting a compound of formula (50) with an oxidizing reagent wherein: R2 is a carboxylic acid protecting group; R4 is -C(R30)3 provided that R4, taken as a whole, contains 0 to 3 W groups substituted with 0 to 3 R29 groups and in addition 1 to 12 carbon atoms substituted with 0 to 3 R22 groups. each R20 is independently H or alkyl; each R21 is independently R20, Br, Cl, F, I, CN, NO2 or N3; each R30 is independently H, R24, W or R24aW; W is optionally substituted carbocyclic or heterocyclic radical; R24 is independently R23 wherein each R23 is substituted with 0 to 3 R22 groups; R24a is optionally substituted independently alkylene, alkenylene or alkynylene; R23 is independently alkyl, alkenyl or alkynyl Y1 is a mono-, di- or unsubstituted amino group and each R22 and R29 are as defined in the specification. A process for preparing compounds of formula (61) comprises reacting a compound of formula (51) with a base wherein R2, R4, R21, R20 and Y1 are as defined above.