Antistatisk middel, fremgangsmÕte for fremstilling derav, og anvendelse derav for fremstilling av antistatiske belegg

• Main Authors: AMBERG-SCHWAB, SABINE, ROSE, KLAUS
• Format: Patent
• Language: Norwegian
• Published: 28.05.1998
• Edition: 6
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

Antistatic contains organically modified silicic acid (hetero)polycondensate(s), obtained by hydrolytic (partial) condensation of silicon compound(s) undergoing hydrolytic condensation and optionally other elements of boron, aluminium, phosphorus, tin, lead, transition metals, lanthanides and actinides and/or precondensates derived from these compounds by the action of water or moisture, optionally in the presence of a catalyst or solvent. 0-35 Mole-% is derived from Si compounds of formula (I). The antistatic contains 0-30 mole-% amine and/or quaternary ammonium compound(s), which contain organic group(s) with group(s) capable of polymerisation and/or polyaddition, and 0-30 mole-% salt(s) of optionally substituted (meth)acrylic acid, the total amount of (I), compounds and salts with respect to the condensate being 1-30 mole-%: ZaSiXbR(4-a-b) (I) X = hydrogen, halogen, hydroxyl, optionally substituted alkoxy, acyloxy, alkylcarbonyl, alkoxycarbonyl or an amino group NR'2; Z = R 2N-(R -NR -)k-R -, 1/m Am<->R 2N<+>-R -, (HO-R )2N-R , Cl-SO2-R -, (R O)2P(O)-R , 1/m Am<-)<R 2N)2C=S<+>-R -, 3/n Kn<+)<<->OOC)2N-R -N(COO<->)-R -, 1/m Am<->H2C=C(R )-R -N<+)<R 2)-R - or 1/m Am<-> H2C=C(R )-CO-O-R -N<+)<R 2)-R - or a quaternary ammonium salt derived from one of these; R = optionally substituted alk(en)yl, (alkyl)aryl or arylalkyl; R' = H, alkyl or aryl; R = H, optionally substituted alk(en)yl, (alkyl)aryl or arylalkyl; R = optionally substituted alk(en)ylene or arylene; Am<-> = an anion with charge m; Kn<+> = a cation with charge n; a, b = 1, 2 or 3; a+b = 2, 3 or 4; and k = 0, 1, 2 or 3.