METHOD AND DEVICE FOR GENERATING SECONDARY RADIATION, IN PARTICULAR EUV RADIATION, USING AT LEAST ONE LASER

• Main Authors: STEFAN SCHARRING, RAOUL-AMADEUS LORBEER
• Format: Patent
• Language: English
• Published: 26.07.2024
• Subjects: ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; X-RAY TECHNIQUE

The invention relates to a method and a device for generating secondary radiation, in particular EUV radiation, wherein a surface (42) of a 5 workpiece (40) is irradiated with at least a first and at least a second laser pulse. With the at least one first laser pulse, at least one material sheet (46...