METHOD AND DEVICE FOR GENERATING SECONDARY RADIATION, IN PARTICULAR EUV RADIATION, USING AT LEAST ONE LASER

The invention relates to a method and a device for generating secondary radiation, in particular EUV radiation, wherein a surface (42) of a 5 workpiece (40) is irradiated with at least a first and at least a second laser pulse. With the at least one first laser pulse, at least one material sheet (46...

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Bibliographic Details
Main Authors STEFAN SCHARRING, RAOUL-AMADEUS LORBEER
Format Patent
LanguageEnglish
Published 26.07.2024
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
X-RAY TECHNIQUE
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Summary:The invention relates to a method and a device for generating secondary radiation, in particular EUV radiation, wherein a surface (42) of a 5 workpiece (40) is irradiated with at least a first and at least a second laser pulse. With the at least one first laser pulse, at least one material sheet (46) is detached from the surface (42), in particular by means of a tensile wave, and with the at least one second laser pulse, a plasma is generated from parts of the detached material sheet (46) and secondary radiation is 10 generated. The secondary radiation is coupled out for use in a subsequent process, in particular a lithography process. (Figure 1)
Bibliography:Application Number: NL20242036822