EXTREME ULTRAVIOLET LIGHT GENERATION METHOD, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD

An extreme ultraviolet light generation method includes a target supply step of outputting a droplet target into a chamber, a prepulse laser light irradiation step of irradiating the droplet target with prepulse laser light to generate a diffusion target, and a main pulse laser light irradiation ste...

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Bibliographic Details
Main Authors KOUICHIRO KOUGE, HIROKAZU HOSODA, YOSHIYUKI HONDA
Format Patent
LanguageEnglish
Published 08.07.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
X-RAY TECHNIQUE
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Summary:An extreme ultraviolet light generation method includes a target supply step of outputting a droplet target into a chamber, a prepulse laser light irradiation step of irradiating the droplet target with prepulse laser light to generate a diffusion target, and a main pulse laser light irradiation step of irradiating the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, the main pulse laser light includes first main pulse laser light and second main pulse laser light, and in the main pulse laser light irradiation step, the diffusion target is irradiated with the first main pulse laser light having higher energy density at a central portion than at an outer peripheral portion and the second main pulse laser light having higher energy density at the outer peripheral portion than at the central portion.
Bibliography:Application Number: NL20222032877