METHOD AND CAMERA SYSTEM FOR DETECTING SUBSTRATE POSITIONS IN A SUBSTRATE CASSETTE

The invention relates to a method of detecting substrate positions of substrates (12) arranged in a row, in particular of wafers in a substrate cassette (14), wherein pictures of the substrates (12) are taken from at least two recording positions (18) and wherein the recording positions (18) are so...

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Bibliographic Details
Main Authors MARKUS SCHIEBER, RISHAV MUKHERJEE, UWE VOGLER, PAUL BERTHOLD
Format Patent
LanguageEnglish
Published 16.06.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The invention relates to a method of detecting substrate positions of substrates (12) arranged in a row, in particular of wafers in a substrate cassette (14), wherein pictures of the substrates (12) are taken from at least two recording positions (18) and wherein the recording positions (18) are so far away from the substrates (12) that two pictures taken from mutually adjacent recording positions (18) have at least partially overlapping recording areas, then a three-dimensional reconstruction of the substrates (12) is produced from the overlapping recording areas, and then a position and/or an orientation of the substrates (12) in relation to each other and/or relative to a reference point is determined on the basis of the threedimensional reconstruction. The invention further relates to a camera system (10) for detecting substrate positions.
Bibliography:Application Number: NL20212029928