TARGET SUPPLY DEVICE, TARGET SUPPLY METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD

A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance 5 supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the...

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Bibliographic Details
Main Authors HIROSHI SOMEYA, TSUKASA HORI, TOSHIHIRO NISHISAKA, YUTAKA SHIRAISHI, YUKIO WATANABE
Format Patent
LanguageEnglish
Published 01.12.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
X-RAY TECHNIQUE
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Summary:A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance 5 supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a 10 second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.
Bibliography:Application Number: NL20212027804