PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS

• Main Authors: ZOMER SILVESTER HOUWELING, DAVID FERDINAND VLES, SANDER BALTUSSEN, ARNOUD WILLEM NOTENBOOM, PAUL ALEXANDER VERMEULEN, INCI DONMEZ NOYAN, MARCUS ADRIANUS VAN DE KERKHOF, TIES WOUTER VAN DER WOORD, ALEXANDR DOLGOV, VICTORIA VORONINA, ANDREY NIKIPELOV, HALIL GÖKAY YEGEN, VADIM YEVGENYEVICH BANINE
• Format: Patent
• Language: English
• Published: 14.10.2021
• Subjects: APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBONFILAMENTS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS,THREADS, FIBRES, BRISTLES OR RIBBONS; CHEMISTRY; CINEMATOGRAPHY; COMPOUNDS THEREOF; ELECTROGRAPHY; HOLOGRAPHY; INORGANIC CHEMISTRY; MATERIALS THEREFOR; METALLURGY; NATURAL OR ARTIFICIAL THREADS OR FIBRES; NON-METALLIC ELEMENTS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPINNING; TEXTILES; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.